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Advanced Metallization Conference 2020
30th Asian Session

 Conference Topics of Interest

Integration: Interconnection Structure and Performance, Parasitic Capacitance,
  Reliability Technology, Testing and Analysis
Reliability Science and Failure Analysis: EM, SIV, TDDB, Defect Detection
  and Analysis, Failure Mechanism and Modeling
Metallization: PVD, CVD, ALD, Plating, Barrier Metal, New Material, Alloy,   Supercritical Fluid, Reflow
Low-k Dielectric: CVD, ALD, SOD, Film Properties, New Materials,
  Dielectric Structures (Air Gap), Metrology, etc.
CMP: Planarization Technology, Slurry, Pad, Dress, End Point Detection,
  Cleaning, Anti-corrosive Technology, etc.
Contact: Silicide, Interface, Solid Phase Reaction, Shallow Junction, Crystal   Properties, Electron Properties, Carrier Transport, etc.
MEMS/RF: Interconnection Structure and Materials, Packaging, Fabrication Process   Technology, Device Design, etc.
Emerging Technology: Active Wiring, Power Electronics, Silicon Photonics,   Flexible Electronics, Energy Harvesting, etc.
Backend Device Technology: Tech. for Embedding Devices (MRAM, PCRAM,
  ReRAM, DRAM etc.), Materials and Processing of Magnetics, Phase-Change
  and Resistive-Change Devices, Electrode, Metallization, etc.
Nano Carbon: Graphene, Carbon Nanotube, Deposition, Integration, Electrical
  Characteristics, Reliability, Evaluation, Analysis, etc.
3D and Packaging: TSV, TMV, Stacking Method (CoW, WoW), Thinning,
  Planarization, Bonding, Bump, Stress and Thermal Analysis, Sealing,
  Cooling, Reliability.


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