ADMETA 2025

Advanced Metallization Conference 2025

Topics of interest

Integration: Interconnect Structure and Performance, Parasitic Capacitance, Reliability Technology, Testing and Analysis
◆Reliability: Science and Failure Analysis, EM, SIV, TDDB, Defect Detection and Analysis, Failure Mechanism and Modeling
Metallization: PVD, CVD, ALD, Plating, Barrier Metal, New Material, Alloy, Supercritical Fluid, Reflow
Interconnects patterning: Etching, Lithography, Advanced Patterning, Hard Mask, Pattern Transfer, SAMs,
Low-k Dielectric: CVD, ALD, SOD, Film Properties, New Materials, Dielectric Structures (Air Gap), Metrology
CMP: Planarization Technology, Slurry, Pad, Dress, End Point Detection, Cleaning, Anti-corrosive Technology
Contact: Silicide, Interface, Solid Phase Reaction, Shallow Junction, Crystal Properties, Electron Properties, Carrier Transport
MEMS/RF: Interconnection Structure and Materials, Packaging, Fabrication Process Technology, Device Design
Emerging Technology: Active Wiring, Power Electronics, Silicon Photonics, Flexible Electronics, Energy Harvesting
Backend Device Technology: Tech. for Embedding Devices (MRAM, PCRAM, ReRAM, DRAM etc.), Materials and Processing of Magnetics, Phase-Change and Resistive-Change Devices, Electrode, Metallization
Nano Carbon and 2D materials:  Graphene, CNT, Transition-metal Dichalcogenide, Deposition, Integration, Electrical Characteristics, Reliability, Evaluation, Analysis
3D and Packaging: TSV, TMV, Stacking Method (CoW, WoW), Heterogeneous Integration, Thinning, Planarization, Mold Compound, Bonding, Bump, Stress and Thermal Analysis, Sealing, Cooling, Reliability

Conference Topics: October 9-10, 2025 (in English)

Advanced Integration and Process
Advanced Metallization
CMP and Cleaning
Emerging Technologies
Next Generation Interconnect (Carbon, Optical Interconnect etc.)
Thin films and Dielectrics
3D Device, TSV and Packaging

Tutorial Topics: October 8, 2025 (in Japanese)

Semiconductor Market Trend
Logic Integration (FEOL)
BEOL Integration and reliability
Memory (DRAM or/and NAND)
3D Packages
CVD/ALD
Etching
Metal
CMP

* The full list of invited speakers and tutorial lecturers will be announced later.
** The official language of the tutorial lecturers is Japanese.

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