Local Organizing Committee
Young-Chang Joo, Seoul National University
Seok-Hee Lee, SK Hynix
Jun-Yeob Song, Korea Institute of Machinery & Materials
Gil-Hyeon Choi, Samsung Electronics
Hoo-Jeong Lee, Sungkyunkwan University
Young-Bae Park, Angond National University
Han-Bo-Ram Lee, Incheon National University
Sarah Eunkyung Kim, Seoul National University of Science & Technology
Oh Joong Kwon, Incheon National University
Jin-Goo Park, Hanyang University
Jae Jeong Kim, Seoul National University
Hyungjun Kim, Yonsei University
Jae-Hak Lee, Korea Institute of Machinery & Materials
Hyun-Joong Kim, Seoul National University
Hyun-Chul Sohn, Yonsei University
Yong Tae Kim, Korea Institute of Science and Technology
Nicky Kim, SK Hynix
Tae-je Cho, Samsung Electronics
Sang-Hoon Ahn, Samsung Electronics
Won-Jun Lee, Sejong University
International Committee
T. Nemoto, Tokyo Electron
O. Nakatsuka, Nagoya University
M. B. Takeyama, Kitami Institute of Technology
A. Tsukune, Taiyo Nippon Sanso
H. Machida Gas-Phase Growth
N. Hata, AIST
E. Kondoh, Yamanashi University
F. Ito, Toshiba
T. Owada, Socionext
T. Saito, Osaka Prefecture University
A. Kajita, Toshiba
M. Tada, NEC
K. Maekawa, Renesas Electronics
Y. Yamada, SanDisk
S. Yokogawa, Polytechnic University
S. Hizume, Lam Research
T. Nakada, Ebara
H. Sakurai, Hitachi Chemical
D. Ishikawa, ASM Japan
K. Shimizu, Sony
Y. Higuchi, ULVAC
S. Nomura, Hitachi Chemical
T. Nogami, IBMC.-C. Liu, United Microelectronics Corp.
L. J. Chen, National Tsing Hua University
T. K. Ku, ITRI (Industrial Technology Research Institute)
C. S. Tan, Nanyang Technological University
X. Gu, SMIC(Semiconductor Manufacturing International Cop.)
Advisory Board
Y. Horiike, NIMS
H. Komiyama, Mitsubishi Research Institute
K. Tsubouchi, Tohoku University
M. Murakami, Ritsumeikan
N. Kobayashi, ASM Japan
Y. Yasuda, Tohoku University
T. Kikkawa, Hiroshima University
T. Ohba, Tokyo Institute of Technology
S. Zaima, Nagoya University
T. Ohta, The University of Tokyo
K. Masu, Tokyo Institute of Technology
M. Tsujimura, Ebara
A. Ohsaki, Shin-Etsu Chemical
S. Shingubara, Kansai University
T. Yoda, NuFlare Technology
Y. Shimogaki, The University of Tokyo
S. Kondo, Hitachi Chemical
K. Ueno, Shibaura Institute of Technology
H. Kawasaki, Quantum Biosystems
J. Koike, Tohoku University
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