On the day preceding the conference, a short course summarizing the current status of advanced ULSI metallization and interconnects will be presented, utilizing the collective wisdom of several leaders in the field.

Tutorial Program

October 18

09:30-10:15　Metallization
                     Junichi Koike (Tohoku University)

10:20-11:05　 BEOL Technology
                     Takeshi Nogami (IBM Research)

11:10-11:55    CVD/ALD
                     Nobuyoshi Kobayashi (ASM Japan)

13:00-13:45    Market Trend in Semiconductor
                  Takashi Yunogami (Microfabrication Research Institute)

13:50-14:35　 Dry etching
                      Kazuo Nojiri (Lam Research)

14:40-15:25　 Memory Device
                      Nozomu Matsuzaki (Hitachi High-Technologies）

15:40-16:25     CMP Process
                      Shunichi Shibuki (Sony Semiconductor Manufacturing)

16:30-17:15　  Reliability
                       Naohito Suzumura (Renesas Electronics)

*Official language of the short course is Japanese.
*Title of each lectures are tentative.