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Advanced Metallization Conference 2016
26th Asian Session
 Tutorial

On the day preceding the conference, a short course summarizing the current status of advanced ULSI metallization and interconnects will be presented, utilizing the collective wisdom of several leaders in the field.

Tutorial Program

1) BEOL Technology Revisited, What's for the next stages ?
Yoshihiro Hayashi (Renesas Electronics)

2) Mettalization
Kazuyoshi Maekawa (Renesas Semiconductor Manufacturing)

3) Chemical-Mechanical Polishing - Advances and Future Challenges
Yohei Yamada (SanDisk)

4) Insulating film
Fuminori Ito (Toshiba)

5) Trends in Semiconductor Market and Future
Yoshitsugu Yamamoto (Mizuho Securities)

6) Dry etching
Naoki Inagaki (Tokyo Electron)

7) Image sensor
Toshio Kato (Success International)

8) 3D Packaging
Jun Mizuno(Waseda University)

*Official language of the short course is Japanese.
*Title of each lectures are tentative.

 
 

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